I can become stronger by paying salaries. I have one billion employees!

Chapter 611 The development process of domestically produced lithography machines has been shortened by at least ten years!

Since StarSource Technology and the Institute of Optoelectronics under the Huazhong University of Science and Technology jointly developed the 'Magnetic Confinement Discharge Plasma Source' (MDP) technology, they have begun to tackle the second major technological barrier of lithography machines—the optical system.

After all, simply 'creating light' is not enough; one must also 'make good use of that light' to complete wafer exposure and ultimately achieve chip manufacturing.

What frustrated Chen Yansen was that the mainstream research and development direction of EUV light source excitation methods in China was mainly based on laser-generated plasma, discharge plasma, or laser-induced discharge plasma.

However, the skills and project experience of the vast majority of engineers in the Optics Department of Xingyuan Technology do not match the research and development needs.

Therefore, the development of the supporting optical system was extremely slow.

It is important to know that EUV light is absorbed by almost all substances, so traditional glass lenses cannot be used. The entire optical path must use a reflective optical system in a vacuum environment.

The collecting mirror, lighting system, projection lens system, mask, and mask stage all require matching technical solutions.

MDP-EUV light source technology has indeed blazed a unique new trail, but this innovation has not come without a price.

You have to clear all obstacles yourself.

Upon learning of the optical department's research and development progress, Chen Yansen immediately felt despair.

He knew in his heart that if he didn't show these people a way out, they might not be able to take a single step forward for five or ten years.

It must be said that he overestimated the capabilities of Lin Nan's team.

He never expected that such a simple technical solution would leave Lin Nan and his team stuck on the edge of the right path for forty or fifty days without making any progress.

Therefore, after developing Mass V1.0, Chen Yansen immediately designed the "Multi-shell Grazing Incidence Elliptical Collection Mirror System".

This device is essentially a sophisticated multi-layered mirror that can efficiently capture EUV light sources and initially focus and guide them into the lighting system.

There are two main challenges: collection efficiency and damage resistance.

The former is because EUV light radiates in all directions. To improve collection efficiency, a complex multi-mirror splicing structure must be designed, while ensuring that the angle calibration accuracy of each mirror reaches the micrometer level.

However, any deviation in angle will cause light to leak out, thus affecting the collection efficiency.

The latter is because plasma light sources generate extremely high temperatures when excited, which requires extremely strong damage resistance.

Collection efficiency requires multilayer films to have characteristics such as "thin, uniform, pure, and unobstructed" in order to maximize reflectivity and angle adaptability.

The requirement for damage resistance necessitates that the multilayer film be "thick, hard, and corrosion-resistant," necessitating the addition of an extra protective layer.

It sounds contradictory, but that's precisely where the technical challenge of collecting mirrors lies.

Chen Yansen's "multi-shell grazing incidence elliptical collection mirror system" strikes a good balance between collection efficiency and damage resistance.

It can not only efficiently capture 13.5 nm EUV light generated by high-power pulsed discharge and bombardment of a tin target, but also focus it to a distant central focal point, providing a sufficiently powerful and uniform beam for subsequent lighting systems.

at the same time.

Lin Nan quickly discovered the encrypted email. After opening the technical document, he glanced at it quickly and then froze on the spot.

The solution sent by the boss is so comprehensive, from the optical design configuration and incident angle to the substrate material, reflective coating, thermal management subsystem and electromagnetic field debris mitigation system, and even the parameter table of the coating process and the algorithm model for error calibration are included.

The Optics Department had been debating the "multi-mirror splicing angle deviation" issue for half a month. The document directly provided a solution of "real-time laser interference calibration", and even the laser wavelength and sampling frequency used for calibration were clearly marked.

Lin Nan suddenly stood up, his voice trembling slightly: "This is practically writing out the answer!"

The technical documentation doesn't credit the owner. Did the boss buy or steal this technology, or does Senlian Capital actually have another R&D lab besides Xingyuan Technology's optical department?
Lin Nan sat at his workstation, his mind wandering.

He had asked Liang Jinsong and Chen Yansen about the MDP-EUV light source technology last time.

Liang Jinsong was completely confused, and Chen Yansen told him not to ask around, so he could only suppress his curiosity.

But this time, he couldn't hold back.

The technology of the "multi-shell grazing incidence elliptical collection mirror system" was simply too advanced; it was a complete and mature technical solution, leaving him no choice but to think about it.

Lin Nan pondered for a long time, then finally gave a bitter laugh and put his right hand, which was holding the phone, down again.

He knew that some questions, if others didn't want to talk about them, meant they couldn't be talked about, or that there were simply no answers.

He then immediately convened a meeting with the core R&D personnel.

Inside the meeting room, the previously subdued atmosphere instantly erupted when everyone saw the 3D model of the "multi-shell elliptical structure" in the document.

The chief engineer of the optical system design group pointed to the screen and said, "The inner lens is responsible for capturing EUV light within a central 60-degree range, the middle lens covers 60 to 120 degrees, and the outer lens completes the 120 to 180 degrees. This way, the collection efficiency can be improved to at least 80%, which is incomparable. What's the difference between our previous solution and garbage?"

What surprised everyone even more was the thermal management subsystem!

The document proposes embedding a microchannel water-cooling structure inside the mirror body, combined with a high-temperature resistant molybdenum-rhenium alloy substrate, which can withstand the high-temperature impact of plasma and avoid the shedding of multilayer films due to excessive temperature.

"Our biggest concern is 'high-temperature damage,' but this solution has even calculated the diameter of the water-cooling channel and the water flow velocity!"

The materials engineer flipped to the process parameters page and said excitedly.

"By the way, Engineer Lin! This gradient coating scheme, from the molybdenum-silicon multilayer film to the silicon dioxide protective layer, requires the thickness error of each layer to be controlled within 0.1 nanometers. It also requires 80 depositions using pulsed laser deposition. Can our equipment achieve this level of precision?"

Someone looked troubled and worried. Lin Nan frowned and looked at the chief engineer of the equipment group, asking, "Can the Zeiss coating machine maintain a stable precision between 0.05 and 0.1 nanometers under constant temperature and humidity conditions?"

The chief engineer of the equipment group thought for a moment and answered very meticulously: "The thickness error of continuously depositing 10 layers of molybdenum-silicon film is 0.04 nanometers at the minimum and 0.09 nanometers at the maximum, which just meets the requirements of the scheme."

The problem is that each time the target material is changed or the laser power is adjusted, the error fluctuates by 0.12 to 0.15 nanometers. After 80 depositions, the cumulative error may exceed the acceptable range.

After thinking for a moment, Lin Nan offered a solution: "Then let's add a real-time calibration process. The algorithm team should first develop a film thickness monitoring program that is linked to the sensors of the coating machine. Every 10 layers deposited, it will automatically pause and scan the film thickness with an electron microscope."

Adjust the laser power and deposition time for the next round based on the measured data, and control the single error to within 0.05 nanometers.

Additionally, a temperature-controlled enclosure should be added around the coating machine to prevent the negative effects of temperature.

Upon hearing this, the others immediately understood.

Lin Nan is, after all, a senior engineer at the Shanghai Institute of Optics and Precision Mechanics, possessing both ability and technical skills. He was also a talent strongly recommended by Hu Ruihui, so it's normal for him to come up with effective solutions at critical moments.

In fact, in Chen Yansen's view, people like Lin Nan have good intelligence, comprehension and creativity, but they are unable to access the top technology of EUV optics, which is why they are going around in circles.

If he had the same research environment, Lin Nan might have been able to develop a collection mirror system, but ultimately, there are no "what ifs".

Chen Yansen was able to master this technology thanks to his mental strength, which was a hundred times greater than that of ordinary people, and his talent for the Planck Clock, which allowed him to enter an overclocked state of mind.

Otherwise, with his original abilities, he might have been able to break through this technology, but it would have taken him much longer than half a month.

After obtaining the technical solution for the "multi-shell grazing incidence elliptical collection mirror system", the entire Optics Department of Xingyuan Technology immediately devoted all its efforts to repeatedly refine and reproduce the system as quickly as possible, striving to successfully apply it to actual production.

The algorithm team worked overtime overnight and completed the development of the film thickness monitoring program within three days.

The program can collect laser power and deposition time data of the coating machine in real time, and can also automatically generate film thickness error curves. When the error exceeds 0.05 nanometers, it will trigger a pause command to calibrate the accuracy in real time.

Because the R&D center also has a large number of engineers from the Institute of Optoelectronics, the bigwigs of the Science Association learned about Xingyuan Technology's technological breakthrough in no time.

"Old Hu, could you ask around for me if Xingyuan Technology is still hiring?"

Wang Xiangchao from the Shanghai Institute of Optics and Fine Mechanics proactively dialed Hu Ruihui's number and stammered as he spoke.

"What do you mean? You want to quit? Are you kidding me!"

Hu Ruihui countered with a question.

Wang Xiangchao is a pillar of the Shanghai Institute of Optics and Fine Mechanics. His main research focus is on EUV light sources. He has applied for more than 170 patents and is a true industry leader.

"Old Hu, Xingyuan Technology has even developed its own collection mirror system. Do you know what that means? If we go any further, the light source system will be fully operational. Once the development of the dual-stage system is completed, the first domestically produced EUV lithography machine will have a technological foundation. Do you understand?"

Wang Xiangchao held the phone and asked a series of questions.

"Old Wang, you're getting on in years..."

Hu Ruihui said quietly.

"Bullshit! Sixty years old is the age to work hard! Forget it, I'll go find Lin Nan instead. After all, I'm his former boss."

When Wang Xiangchao saw Hu Ruihui's hesitant and evasive manner, he instantly became furious.

Logically, it would have been more convenient for him to contact Lin Nan, but he was a little embarrassed to do so.

Is this system really that influential?

Hu Ruihui is a chip design engineer and naturally understands EUV lithography technology, but only to the surface.

For example, someone may have eaten a cake and know what ingredients it is made of, but they may not know the steps and details of its preparation.

"The development process of domestically produced lithography machines has been shortened by at least ten years!"

Wang Xiangchao gave his assessment with certainty.

Hu Ruihui knew that Wang Xiangchao was a meticulous person who would never speak carelessly. He took a deep breath and finally realized the abnormal nature of Xingyuan Technology.

The information was reported up the chain of command, and a detailed investigation report was quickly delivered to Li Qingsong's desk.

"We will maintain strict confidentiality and send some of our researchers in optics, dual-stage, and leveling/focusing fields to Xingyuan Technology."

The seminar was held in the morning, and the resolutions took effect on the same day.

The allure of domestically produced EUV lithography machines is too great!

As long as you participate, you can gain a record of achievements that will be recorded in history. No one wants to miss such an opportunity.

After Li Qingsong issued the decision, scientific research resources across the country began to converge on Xingyuan Technology.

Three days later, 87 experts from the Shanghai Institute of Optics and Fine Mechanics, the Shenyang Institute of Automation of the Huazhong University of Science and Technology Association, the National University of Defense Technology, and other associations arrived in Luzhou.

The team includes industry veterans like Wang Xiangchao, who have been deeply involved in the EUV field for decades, as well as promising young talents who have made their mark in the research and development of dual-stage and leveling/focusing systems.

Even the 65-nanometer dual-stage process technology mastered by Huazhuo Precision Technology was sent to Shanghai.

(End of this chapter)